1. Exposure: Exposure machine power should be above 2kw; exposure time no less than 300 seconds. Use of 21 step sensitivity guide and 9~11 range exposure is recommended.
2. Developing: Use NaOH solution, suggested solution temperature is 21-29℃.
3. Touch up: Examine the developed plate for flaws and touch up as needed.
4. Descumming: Put finished plate into 3%-5% (Volume) nitric acid solution, use brush to clean the plate surface. Apply
Arabic gum evenly on the plate surface after cleaning with water, and then the plate is ready for next step etching.
5. Etching bath preparation: Prepare it for different etching plate accordingly.
6. Etching settings: Set the etching data for different plates.
7. Bath acid replenishment.
8. Top coating removal (optional).

1. Exposure: Exposure machine power should be above 2kw; exposure time no less than 300 seconds. Use of 21 step sensitivity guide and 9~11 range exposure is recommended.
2. Developing: Use NaOH solution, suggested solution temperature is 21-29℃.
3. Touch up: Examine the developed plate for flaws and touch up as needed.
4. Descumming: Put finished plate into 3%-5% (Volume) nitric acid solution, use brush to clean the plate surface. Apply
Arabic gum evenly on the plate surface after cleaning with water, and then the plate is ready for next step etching.
5. Etching bath preparation: Prepare it for different etching plate accordingly.
6. Etching settings: Set the etching data for different plates.
7. Bath acid replenishment.
8. Top coating removal (optional).

1. Exposure: Exposure machine power should be above 2kw; exposure time no less than 300 seconds. Use of 21 step sensitivity guide and 9~11 range exposure is recommended.
2. Developing: Use NaOH solution, suggested solution temperature is 21-29℃.
3. Touch up: Examine the developed plate for flaws and touch up as needed.
4. Descumming: Put finished plate into 3%-5% (Volume) nitric acid solution, use brush to clean the plate surface. Apply
Arabic gum evenly on the plate surface after cleaning with water, and then the plate is ready for next step etching.
5. Etching bath preparation: Prepare it for different etching plate accordingly.
6. Etching settings: Set the etching data for different plates.
7. Bath acid replenishment.
8. Top coating removal (optional).

1. Exposure: Exposure machine power should be above 2kw; exposure time no less than 300 seconds. Use of 21 step sensitivity guide and 9~11 range exposure is recommended.
2. Developing: Use NaOH solution, suggested solution temperature is 21-29℃.
3. Touch up: Examine the developed plate for flaws and touch up as needed.
4. Descumming: Put finished plate into 3%-5% (Volume) nitric acid solution, use brush to clean the plate surface. Apply
Arabic gum evenly on the plate surface after cleaning with water, and then the plate is ready for next step etching.
5. Etching bath preparation: Prepare it for different etching plate accordingly.
6. Etching settings: Set the etching data for different plates.
7. Bath acid replenishment.
8. Top coating removal (optional).

1. Exposure: Exposure machine power should be above 2kw; exposure time no less than 300 seconds. Use of 21 step sensitivity guide and 9~11 range exposure is recommended.
2. Developing: Use NaOH solution, suggested solution temperature is 21-29℃.
3. Touch up: Examine the developed plate for flaws and touch up as needed.
4. Descumming: Put finished plate into 3%-5% (Volume) nitric acid solution, use brush to clean the plate surface. Apply
Arabic gum evenly on the plate surface after cleaning with water, and then the plate is ready for next step etching.
5. Etching bath preparation: Prepare it for different etching plate accordingly.
6. Etching settings: Set the etching data for different plates.
7. Bath acid replenishment.
8. Top coating removal (optional).

1. Exposure: Exposure machine power should be above 2kw; exposure time no less than 300 seconds. Use of 21 step sensitivity guide and 9~11 range exposure is recommended.
2. Developing: Use NaOH solution, suggested solution temperature is 21-29℃.
3. Touch up: Examine the developed plate for flaws and touch up as needed.
4. Descumming: Put finished plate into 3%-5% (Volume) nitric acid solution, use brush to clean the plate surface. Apply
Arabic gum evenly on the plate surface after cleaning with water, and then the plate is ready for next step etching.
5. Etching bath preparation: Prepare it for different etching plate accordingly.
6. Etching settings: Set the etching data for different plates.
7. Bath acid replenishment.
8. Top coating removal (optional).

1. Exposure: Exposure machine power should be above 2kw; exposure time no less than 300 seconds. Use of 21 step sensitivity guide and 9~11 range exposure is recommended.
2. Developing: Use NaOH solution, suggested solution temperature is 21-29℃.
3. Touch up: Examine the developed plate for flaws and touch up as needed.
4. Descumming: Put finished plate into 3%-5% (Volume) nitric acid solution, use brush to clean the plate surface. Apply
Arabic gum evenly on the plate surface after cleaning with water, and then the plate is ready for next step etching.
5. Etching bath preparation: Prepare it for different etching plate accordingly.
6. Etching settings: Set the etching data for different plates.
7. Bath acid replenishment.
8. Top coating removal (optional).